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XPhos Pd G3

XPhos Pd G3 structure

XPhos Pd G3 

structure

XPhos Pd G3 Basic Attributes

847.45600

843.30700

Characteristics

85.21000

13.89620

146-151°C (decomposition)

Safety Information

NONH for all modes of transport

3

61

XPhos Pd G3 Use and Manufacturing

A 300-mL round-bottomed flask equipped with a stir bar and rubber septum was charged with μ-OMs dimer 3 (11.92 g, 15.25 mmol, 0.50 eq) and XPhos (14.52 g, 30.5 mmol, 1.00 eq). The flask was evacuated under vacuum and backfilled with argon (this procedure was repeated twice), after which THF (120 mL) was added. The reaction mixture was stirred at room temperature for 45 min. After removal of 90percent of the solvent under vacuum the product was precipitated from pentane to afford the title compound as an off-white solid as the 1:1 THF complex. THF could be removed by dissolving the solid in DCM and reprecipitating with pentane. Yield: 25.5 g, 92percent. FIG. 7. [0295] FIG. 8 tabulates the percent yield of various precatalysts formed using the procedures outlined above.A 300-mL round-bottomed flask equipped with a stir bar and rubber septum was charged with mu-OMs dimer 3 (11.92 g, 15.25 mmol, 0.50 eq) and XPhos (14.52 g, 30.5 mmol, 1.00 eq). The flask was evacuated under vacuum and backfilled with argon (this procedure was repeated twice), after which THF (120 mL) was added. The reaction mixture was stirred at room temperature for 45 min. After removal of 90% of the solvent under vacuum the product was precipitated from pentane to afford the title compound as an off-white solid as the 1:1 THF complex. THF could be removed by dissolving the solid in DCM and reprecipitating with pentane. Yield: 25.5 g, 92%. FIG. 7. [0295] FIG. 8 tabulates the % yield of various precatalysts formed using the procedures outlined above.

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