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4,4,5,5-Tetramethyl-2-o-tolyl-1,3,2-dioxaborolane

4,4,5,5-Tetramethyl-2-o-tolyl-1,3,2-dioxaborolane structure

CAS No:
195062-59-0
Formula:
C13H19BO2
Chemical Name:
4,4,5,5-Tetramethyl-2-o-tolyl-1,3,2-dioxaborolane
Synonyms:
1,3,2-Dioxaborolane,4,4,5,5-tetramethyl-2-(2-methylphenyl)-;4,4,5,5-Tetramethyl-2-(2-methylphenyl)-1,3,2-dioxaborolane;2-(2-Methylphenyl)-4,4,5,5-tetramethyl-1,3,2-dioxaborolane;4,4,5,5-Tetramethyl-2-o-tolyl-1,3,2-dioxaborolane;(o-Methylphenyl)pinacolborane;2-Tolylboronic acid pinacol ester;2-Methylphenylboronic acid pinacol ester
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Pharmaceutical Intermediates > Bulk Drug Intermediates

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4,4,5,5-Tetramethyl-2-o-tolyl-1,3,2-dioxaborolane Basic Attributes

Molecular Weight：

218.1

Exact Mass：

218.10

DSSTox ID：

DTXSID70443748

Characteristics

Density：

0.98±0.1 g/cm3

Melting Point：

18 °C

Boiling Point：

303.1±21.0 °C(Predicted)

Refractive Index：

1.4950 to 1.4990

Safety Information

hazard class code：

36/37/38-22

safety instructions：

26-36

Marks：

GHS Classification：

|Warning|H302 (50%): Harmful if swallowed [Warning Acute toxicity, oral]|P261, P264, P270, P271, P280, P301+P312, P302+P352, P304+P312, P304+P340, P305+P351+P338, P312, P321, P322, P330, P332+P313, P337+P313, P362, P363, and P501|Aggregated GHS information provided by 2 companies from 2 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.

4,4,5,5-Tetramethyl-2-o-tolyl-1,3,2-dioxaborolane Use and Manufacturing

suzuki reaction

Computed Properties

Molecular Weight:218.10
Hydrogen Bond Acceptor Count:2
Rotatable Bond Count:1
Exact Mass:218.1478100
Monoisotopic Mass:218.1478100
Topological Polar Surface Area:18.5
Heavy Atom Count:16
Complexity:247
Covalently-Bonded Unit Count:1
Compound Is Canonicalized:Yes

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2-Methylphenylboronic acid pinacol ester

CAS No.: 195062-59-0

Content: 99.00%

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4,4,5,5-tetramethyl-2-(2-methylphenyl)-1,3,2-dioxaborolane

CAS No.: 195062-59-0

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Guide of 4,4,5,5-Tetramethyl-2-o-tolyl-1,3,2-dioxaborolane

Basic Attributes
Characteristics
Safety Information
Use and Manufacturing
Computed Properties
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