POLY(T-BUTYL METHACRYLATE) PtBMA

Applications:

1. Photoresist materials used in microelectronics and semiconductor industries. Due to its excellent solubility and film-forming properties, it is used as high-resolution photoresist. Due to its high transparency and stability, it can be used for extreme ultraviolet (EUV) lithography.
2. Due to its excellent hydrophobicity and chemical corrosion resistance, it is used as various functional coatings.
3. Because the tert-butyl side chain of PtBMA is easily hydrolyzed and converted into a carboxylic acid group in an acidic environment, it can be used to prepare materials with controllable degradation properties.

1)100% product quality assurance;
2) Factory quotation ;we are the real primary source producing and market all by ourselves
3)Professional and long-term after-sales service

Q1:How is the price?
A:we are the real primary source producing and market all by ourselves. We will provide the best quality with reasonable price.

Q2: How can you guarantee the quality ?
A: We can provide you with test reports for all products, you can also send our products to third parties for testing.

Q3: What services are available？
A：We perform strong pre-sale,in-sale,and after-sale execution to eliminate any worries from customers.

Q4：Does it support customization?
A：Yes, customization is accepted. According to your requirements.