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BIS(4-TERT-BUTYLPHENYL)IODONIUM TRIFLATE Purity 99% factory supply

Name: BIS(4-TERT-BUTYLPHENYL)IODONIUM TRIFLATE Purity 99% factory supply
Brand: WEIMAS
SKU: pr2512301156
Availability: InStock

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CAS No.:

84563-54-2

Grade:

Electronic Grade

Content:

99.99%

Port:

SHANGHAI

Brand:

WEIMAS

Packaging:

100g/bottle

Price valid (until):

2026-01-30

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WElMAS

Company Type:

Manufactory

Location:

China

Qualification:

Main Products:

PAG,Resin,PI

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Product Description
Seller Information

Description

Company Detail

WEIMAS is a leading supplier of core materials for high-end semiconductor photoresist. Our main products include Photo Acid Generator (PAG), BARC resin, PHS resin and Photo initiator (PI), which are the core materials for ArFi/ArF/KrF photoresists used in advanced semiconductor manufacturing process and photoresists in the display panel industry. Our technical specifications are all at the leading level in the industry, which can achieve ppb grade metal impurity control.

Items	Specifications
bottle package
purity	99

Certificates

Basic Info

Product Name:

BIS(4-TERT-BUTYLPHENYL)IODONIUM TRIFLATE

Other Name:

BIS(4-TERT-BUTYLPHENYL)IODONIUM TRIFLATE;BIS(4-TERT-BUTYLPHENYL)IODONIUM TRIFLUOROMETHANESULFONATE;Iodonium,bis[4-(1,1-dimethylethyl)phenyl]-,saltwithtrifluoromethanesulfonicacid(1:1);Iodonium,bis[4-(1,1-dimethylethyl) phenyl]- , salt with trifluoromethanesulfonic acid bis(4-tert-butylphenyl)iodonium triflate;Bis(4-tert-butylphenyl)iodoniuM trifluoroMethanesulfonate, Electronic grade, 99+% (Metals basis);Bis(p-tert-butylphenyl)iodonium triflate;Bis(p-tert-butylphenyl)iodonium trifluoromethanesulfonate;Di(4-tert-butylphenyl)iodonium triflate

CAS No.:

84563-54-2

Molecular Formula:

C21H26F3IO3S

InChIKeys:

VGZKCAUAQHHGDK-UHFFFAOYSA-M

Molecular Weight:

542.39

Exact Mass:

542.059937

DSSTox ID:

DTXSID80370536

HScode:

2904909090

Categories:

Organic Reagents

Characteristics

PSA:

65.6

XLogP3:

3.54220

Melting Point:

237 °C(lit.)

Water Solubility:

ethyl lactate: ~25%

See More BIS(4-TERT-BUTYLPHENYL)IODONIUM TRIFLATE Properties 

Hazard Identification

Classification of the substance or mixture

Skin irritation, Category 2

Eye irritation, Category 2

GHS label elements, including precautionary statements

Precautionary statement(s)
Pictogram(s)
Signal word	Warning
Hazard statement(s)	H315 Causes skin irritation H319 Causes serious eye irritation
Prevention	P264 Wash ... thoroughly after handling. P280 Wear protective gloves/protective clothing/eye protection/face protection/hearing protection/...
Response	P302+P352 IF ON SKIN: Wash with plenty of water/... P321 Specific treatment (see ... on this label). P332+P317 If skin irritation occurs: Get medical help. P362+P364 Take off contaminated clothing and wash it before reuse. P305+P351+P338 IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing.
Storage	none
Disposal	none

Other hazards which do not result in classification

no data available

Handling and Storage

Precautions for safe handling

Handling in a well ventilated place. Wear suitable protective clothing. Avoid contact with skin and eyes. Avoid formation of dust and aerosols. Use non-sparking tools. Prevent fire caused by electrostatic discharge steam.

Conditions for safe storage, including any incompatibilities

Store the container tightly closed in a dry, cool and well-ventilated place. Store apart from foodstuff containers or incompatible materials.

See More BIS(4-TERT-BUTYLPHENYL)IODONIUM TRIFLATE Safety Data Sheet 

Seller Information

Business Type:
Manufactory

Main Products:
PAG,Resin,PI

Location:
Room 302&402, Building 7, Xinhong Industrial Park, SIP, Suzhou, China

Total Annual Revenue:
$5 million-$10 million

Total Employees:
51-100

Year of Establishment:
2021

Certifications:
ISO9001,ISO14001

苏州威迈芯材半导体有限公司成立于2021年，主营产品为半导体行业先进制程所用 ArFi/ ArF/KrF级别光刻胶的核心关键主材光致产酸剂（光酸）PAG、BARC树脂、PHS树脂和显示面板行业光刻胶核心主材光引发剂PI等，以ppb级别金属杂质控制为核心的各项技术指标均保持行业领先水平。

WEIMAS is a leading supplier of core materials for high-end semiconductor photoresist. Our main products include Photo Acid Generator (PAG), BARC resin, PHS resin and Photo initiator (PI), which are the core materials for ArFi/ArF/KrF photoresists used in advanced semiconductor manufacturing process and photoresists in the display panel industry. Our technical specifications are all at the leading level in the industry, which can achieve ppb grade metal impurity control.
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