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Home > Chemical Reagents > Organic Reagents > Triphenylsulfonium (3-hydroxytricyclo[3.3.1.13,7]decane-1-methoxycarbonyl)difluoromethane sulfonate
Triphenylsulfonium (3-hydroxytricyclo[3.3.1.13,7]decane-1-methoxycarbonyl)difluoromethane sulfonate buy - large image1
Triphenylsulfonium (3-hydroxytricyclo[3.3.1.13,7]decane-1-methoxycarbonyl)difluoromethane sulfonate buy - image1

Triphenylsulfonium (3-hydroxytricyclo[3.3.1.13,7]decane-1-methoxycarbonyl)difluoromethane sulfonate

Unit Price: Get Latest Price
CAS No.:

912290-04-1

Grade:

Electronic Grade

Content:

99.5%

Port:

Shanghai

Brand:

WEIMAS

Packaging:

100g/bottle

Price valid (until):

2026-02-26

Company Type:
Manufactory
Location:
China
Qualification:
Main Products:

PAG,Resin,PI

  • Product Description

  • Seller Information

  • Description


      Product Detail  


    WEIMAS is a leading supplier of core materials for high-end semiconductor photoresist. Our main products include Photo Acid Generator  (PAG), BARC resin, PHS resin and Photo initiator (PI), which are the core materials for ArFi/ArF/KrF photoresists used in advanced semiconductor manufacturing process and photoresists in the display panel industry. Our technical specifications are all at the leading level in the industry, which can achieve ppb grade metal impurity control.

    Basic Info
    Product Name:

    Triphenylsulfonium salt with 1-[(3-hydroxytricyclo[3.3.1.13,7]dec-1-yl)methyl] 2,2-difluoro-2-sulfoacetate (1:1)

    CAS No.:

    912290-04-1

    Categories:

    Organic Reagents

  • Seller Information
    Business Type:

    Manufactory

    Main Products:

    PAG,Resin,PI

    Location:

    Room 302&402, Building 7, Xinhong Industrial Park, SIP, Suzhou, China

    Total Annual Revenue:

    $5 million-$10 million

    Total Employees:

    51-100

    Year of Establishment:

    2021

    Certifications:

    ISO9001,ISO14001

    苏州威迈芯材半导体有限公司成立于2021年,主营产品为半导体行业先进制程所用 ArFi/ ArF/KrF级别光刻胶的核心关键主材光致产酸剂(光酸)PAG、BARC树脂、PHS树脂和显示面板行业光刻胶核心主材光引发剂PI等,以ppb级别金属杂质控制为核心的各项技术指标均保持行业领先水平。

    WEIMAS is a leading supplier of core materials for high-end semiconductor photoresist. Our main products include Photo Acid Generator  (PAG), BARC resin, PHS resin and Photo initiator (PI), which are the core materials for ArFi/ArF/KrF photoresists used in advanced semiconductor manufacturing process and photoresists in the display panel industry. Our technical specifications are all at the leading level in the industry, which can achieve ppb grade metal impurity control.

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