Asahi Kasei Plans to Double Photosensitive Polyimide Production Capacity by 2030

Asahi Kasei, a diversified global manufacturer, will increase production capacity for PIMEL photosensitive polyimide (PSPI) at its facility in Fuji City, Shizuoka Prefecture, Japan.

PSPI is a key material in the global electronics industry, primarily used for buffer coatings and passivation layers in semiconductor applications. Asahi Kasei plans to double its production capacity by 2030, demonstrating its commitment to growing its electronics business and solidifying its position as a key supplier to the global semiconductor industry.

Asahi Kasei predicts that demand for interlayer insulating materials for next-generation semiconductors will continue to grow rapidly at an average annual rate of 8%. To meet this rapidly growing demand, Asahi Kasei completed a new plant in Fuji City, Shizuoka Prefecture, in December 2024 to produce PIMEL photosensitive polyimide. Subsequently, the company has decided to further expand production capacity in Fuji City, doubling it by 2030.

This expansion is expected to significantly improve the supply resilience of this key material for semiconductor manufacturing. Asahi Kasei will invest approximately 16 billion yen in this expansion.

PIMEL is used worldwide in a variety of semiconductor applications, such as buffer coatings that improve adhesion between different semiconductor materials and act as a protective barrier.

"The rapid development of generative AI and other advanced technologies is driving unprecedented demand for semiconductor materials like PIMEL PSPI," said Nobuko Uetake, Senior Executive Officer and Core Head of the Electronic Materials Business at Asahi Kasei. "This investment will enhance Asahi Kasei's supply capabilities and solidify our position as a reliable partner to global semiconductor manufacturers to capitalize on this growth opportunity. It supports our broader strategy to build long-term value in high-growth, high-impact sectors."