Company Profile
Tianjin Guangjing Weiye, strategically located in the heart of Tianjin, China, has been a beacon of success since its establishment in 1993, boasting a rich history of accomplishments.
Specializing in the production of a diverse array of chemical products, including Chlorine, Sulfuric Acid, and Nitric Acid, Tianjin Guangjing Weiye serves as a pivotal contributor to various industries, such as oil refining, metallurgy, textiles, and beyond.
Beyond its core chemical offerings, the company extends its expertise through additional services, encompassing the design and construction of chemical production facilities, along with consulting services tailored to chemical production and processing.
With an unwavering commitment to maintaining the highest standards of quality and safety, coupled with stringent adherence to environmental regulations, Tianjin Guangjing Weiye consistently delivers products and services that meet or exceed industry benchmarks. The company's excellence has been acknowledged through numerous awards and accolades.
Having firmly established its presence in the chemical industry, Tianjin Guangjing Weiye has earned the trust of diverse businesses and organizations. Positioned for sustained success, the company's dedication to innovation, quality, and customer service paves the way for a prosperous future.
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Product List
| Product Name | Synonyms | CAS No. | Grate/Content | Operate |
|---|---|---|---|---|
Benzenesulfonic acid |
Benzenesulfonic acid;Phenylsulfonic acid;Besylic acid;Benzenemonosulfonic acid;17-120A;Benzenesulfonic acid (surfactant);BSA;Benzensulfonic acid;BW 70;Alkylbenzenesulfonate;1: PN: WO2020008043 SEQID: 105 claimed sequence;2089288-60-6 |
98-11-3 | Inquiry | |
Cerium dioxide |
Cerium oxide (CeO2);Cerium dioxide;Ceric oxide;Cerium(IV) oxide;Cerium dioxide (CeO2);Ceric oxide (CeO2);Ceria;Ceria (CeO2);Cerium oxide;Cerium(4+) oxide;Molycorp 5310;Needlal;Needlal W 10-01;Needlal W 15;Needlal U 15;Opaline;Needlal U 100;Opaline (oxide);Needlal W 100;TRS 1794;TRS 1793;RN 10C;U 20 (oxide);U 20;Polishing Opaline;HSA 5;A 1;A 1 (ceria);Rhodox 76;Superox 50;GPL-C 1010;Mirek 801;TRS 2005;SRS 135;SRS 123C;Nanotek CeO2;Sunveil A;Cerico;HS 8005;MicroPlanar ST 2100;HF 210;GPL-C S 2125;TE 508;TE 1000;Hastilite 919;Hastilite PO;Purusea SQE 10C;NanoActive CeO2;Shorox;Needlal P 10;E 10;HSA 15;CESL 15N;U 100;Cepol 302;VP AdNano Ceria 50;Needlal B 10;Cepol 120;Needlal H 15;Cerico H;NanoTek CE 6042;HSA 20;FW 30;Nanobyk 3810;DLS 2;Z 1627;JRC-CeO 2;Adnano 90;JRC-CeO 3;CEK01LB Ce-03;Shorox A 10;Shorox F 05;Nanouse CE 20B;Nanotek Slurry CEANB;Nanotek CEANB;CES 303;Nanoceria;Mirek H 510C;HC 60;Rhodia HC 60;Mirek E 05;Nanozyte CeO2 1.5;Nanouse OC-T 20K;CE 20A;Mirek 801A;CZ 30B;NT;LTT;NanoTek Powder CeO2;Shorox FL 2;HC 30;HC 42;Cerium oxide (Ce0.99O1.98);Tecnapow-CeO2;OC-T 20K;VP AdNano Ceria 60;VP Ceria 60;Nano-D CEP;FG 50;Nano-D CEN;Nyacol DP 6255NH4;Cerico CH 501;Dnano CED 401PA;Nanouse CE-T 20B;SN 2;Actalys HSA 5;CESL 30N;Cerico CH-BS 302;CH-BS 302;ZENUS HC-90;Zenus HC-30;Zenus HC 60;Shorox-A20;HSA 20SP;JC-CEOA;VK-CE 01;UG-Ce 01;ZD 9902;385781-69-1;956013-06-2;1028607-87-5;1033016-71-5;1255709-68-2;1310572-48-5;1645286-14-1;1715945-36-0;1800209-57-7;1909261-36-4;1962164-22-2;2257424-51-2 |
1306-38-3 | Inquiry |