Silicon monoxide

Silicon monoxide, also known as silicon oxide (SiO), is an inorganic compound with a unique chemical formula of OSi. In the vast field of chemistry, it occupies a pivotal position and is clearly classified as an important branch of inorganic chemistry - oxides and peroxides. This compound's CAS registration number is 10097-28-6, and in addition, it has many alternative names, such as silicon diene, oxy-oxygen, silicon oxide (OSi), oxy-silicon diene, silicon monoxide, silicon oxide (SiO), and silicon monosiloxane, which all reflect its unique chemical properties and structure. What's more, silicon oxide also has other CAS numbers, such as 12396-92-8, 13779-62-9, and 2281795-36-4, which not only represent its unique identity but also symbolize its widespread application and research in the scientific field.

Silicon monoxide, also known as silicon oxide (SiO), is an inorganic compound with a unique chemical formula of OSi. In the vast field of chemistry, it occupies a pivotal position and is clearly classified as an important branch of inorganic chemistry - oxides and peroxides. This compound's CAS registration number is 10097-28-6, and in addition, it has many alternative names, such as silicon diene, oxy-oxygen, silicon oxide (OSi), oxy-silicon diene, silicon monoxide, silicon oxide (SiO), and silicon monosiloxane, which all reflect its unique chemical properties and structure. What's more, silicon oxide also has other CAS numbers, such as 12396-92-8, 13779-62-9, and 2281795-36-4, which not only represent its unique identity but also symbolize its widespread application and research in the scientific field.

Silicon monoxide (SiO) is another oxide of silicon, used rarely in silicon processing but quite often in thin film, hybrid Ie manufacture. It is useful there because no silicon is available for in situ growth of the dioxide, and it is deposited easily by physical vapor deposition, a process quite similar to the vacuum deposition of aluminum described. Usually the condensed oxide is nonstoichiometric, being a mixture of SiO, Si02, and Si; often, it is designated SiOx .The value of x, which ranges between 1 and 2, is influenced by the deposition conditions.The SiO source material is prepared by heating Si02 with Si, carbon, and hydrogen, or a hydrocarbon, to reduce the dioxide to the monoxide. Reduction takes place at roughly 1000°C, and SiO is formed in the vapor phase. This temperature is much too low to produce a significant vapor pressure of Si02, so the two oxides may be separated. The monoxide vapor is condensed out and subsequently powdered. This material, which is suitable for evaporation, is available commercially and need not be prepared by the IC manufacturer.

brown or black chunks or powder

ChEBI: Silicon monoxide is a silicon oxide.

Silicon Monoxide is primarily used as a vapor-deposited thin-film material in optical coatings and semiconductor applications due to its high refractive index. It also serves as a precursor in the production of silicon-based ceramics and specialty glasses under controlled conditions. Additionally, SiO finds niche use in vacuum metallurgy as a reducing agent or intermediate in high-temperature processes.

Silicon Monoxide is primarily used as a vapor-deposited thin-film material in optical coatings and semiconductor applications due to its high refractive index. It also serves as a precursor in the production of silicon-based ceramics and specialty glasses under controlled conditions. Additionally, SiO finds niche use in vacuum metallurgy as a reducing agent or intermediate in high-temperature processes.

To form thin surface films for protection of alu- minum coatings, optical parts, mirrors, dielectrics, or insulators.

Silicon monoxide (SiO) is a commonly used material for a wide variety of applications with the emphasis on IR multilayer coatings and adhesion promotion. SiO sublimes and should preferably be evaporated from resistance heated boats.AREAS OF APPLICATIONMultilayer coatings especially for the IR, but also the VIS rangeAdhesion promoter (VIS, NIR)Electronics: dielectric, insulating and protective layersDesign: iridescent coatings, colored metallically reflecting coatings e.g. on sun glassesWeb coating: barrier layers on polymer films

Silicon(II) oxide sputtering target coatings are used for optical applications in reflectors, flood lamps, mirrors, jewelry, and other products. The coatings can reduce reflection in the near infrared range or act as interference layers. It is used in thin-film capacitors, hybrid circuits, semiconductor components and other electronic applications.

Molecular Weight:44.084
Hydrogen Bond Acceptor Count:1
Exact Mass:43.971841154
Monoisotopic Mass:43.971841154
Topological Polar Surface Area:17.1
Heavy Atom Count:2
Complexity:2
Covalently-Bonded Unit Count:1
Compound Is Canonicalized:Yes