Mitsui Chemicals Signs Contract with Imec to Jointly Develop Next-Generation EUV Lithography Films

On December 13, Mitsui Chemicals signed a strategic partnership agreement with Imec, the world's leading nanoelectronics and digital technology research and innovation center, to jointly develop extreme ultraviolet (EUV) lithography technology and signed a strategic partnership agreement to commercialize next-generation particles using carbon nanotube (CNT) films for extreme ultraviolet (EUV) lithography.

Through this cooperation, Mitsui Chemicals will combine its own CNT particle technology with imec's CNT particle basic technology and strive to launch products for high-power EUV lithography technology by 2025-2026.

Collaboration to develop next-generation EUV films

Imec will provide consulting and EUV lithography machine evaluation for the commercialization of Mitsui Chemicals' next-generation products. The new generation of CNT colloidal particles is designed to protect photomasks from contamination during EUV lithography and has excellent optical properties such as high EUV transmittance (>94%) and extremely low EUV reflectivity, which is critical for high throughput and throughput in advanced semiconductor manufacturing.

In addition, the new generation of CNT particles can withstand EUV exposure power of more than 1kW, making it suitable for the next generation of EUV lithography machines (>600 W) in ASML's lithography machine innovation roadmap. Companies that use EUV lithography equipment in mass production processes are very interested in the characteristics of this new product. Currently, Mitsui and imec are hoping to accelerate the commercialization of CNT particles for next-generation EUV lithography technology through this cooperation.

Accelerate the deployment of film business

As semiconductors miniaturize and EUV lithography machines become more and more complex, Mitsui Chemicals hopes to commercialize a new generation of thin films to capture the growing demand for semiconductor-related businesses.

Previously, Mitsui Chemicals acquired the protective film business for photomasks in semiconductor and LCD manufacturing processes from Asahi Kasei. In addition to EUV films used in front-end semiconductor processes, it will also produce DUV films used in photolithography processes using deep ultraviolet (DUV) light sources, and make full use of Asahi Kasei's knowledge in this business. The goal is to meet demand by producing films for 3D installation in back-end processes, which will create synergies within its films business.

Today's most advanced semiconductor lithography processes use EUV light sources, specifically 13.5nm light. EUV light allows the construction of smaller unit features in semiconductors. The EUVL system, which currently costs US$150 million, was first deployed by ASML in 2019, and the company has maintained a 100% market share.