DuPont and Beijing Kehua jointly promote the development of advanced lithography materials industry

Recently, DuPont Electronics and Industrial Division and Beijing Kehua Microelectronics Materials Co., Ltd. announced a cooperation plan in Shanghai to provide high-performance lithography materials for Chinese integrated circuit chip manufacturers. Relying on the advantages of both companies, this cooperation aims to meet the industry's demand for advanced photoresist and other photolithographic materials.

According to the World Fab Forecast Report released by the International Semiconductor Industry Association (SEMI), Chinese chip manufacturers announced that they will start construction of 8 new fabs by 2022. These new fabs will accelerate the development of China's domestic semiconductor industry and drive the growing demand for materials and local support in the coming years. The cooperation between DuPont and Beijing Kehua will help Beijing Kehua quickly provide a variety of high-performance lithography materials to help customers develop.

"Beijing Kehua is DuPont's outstanding partner in China, with top-notch technology and excellent team, attaches great importance to customer relations, and insists on quality and customer needs as the orientation, which is in line with our commercial value," DuPont Lithography Said George Barclay, Global Business Director of the Technology Department. "We are very pleased to be able to strongly support the development of the local market through this new cooperation, and we are also very much looking forward to the new opportunities that this will bring."

 "At present, China's photoresist market is in a period of rapid development, Beijing Kehua is in need of a world-class partner like DuPont," said Chen Xin, chairman of Beijing Kehua. She added, "Compared with DuPont's century-old company, Beijing Kehua is still a very young company. We hope to work with DuPont to continuously innovate, focus on challenges, and promote the development of the industry."

DuPont is the world's leading supplier of semiconductor materials and has launched a large number of recognized lithography products with multiple wavelengths, including 193nm (ArF), 248nm (KrF) and i/g-line photoresists, as well as carbon film coatings (SOC), anti-reflective coating (BARC), advanced surface coating and photoresist supporting reagents.

Beijing Kehua has grown into the largest local supplier of IC photoresist in China since its establishment nearly 20 years ago. Products include lithography materials used in integrated circuits (IC), light-emitting diodes (LED), discrete devices, advanced packaging, and microelectromechanical systems (MEMS).