Elementis launches three MIT-free RHEOLATE IF polyether rheology additives

Elementis releases three new rheology additive products, RHEOLATE 644 IF, RHEOLATE 655 IF and RHEOLATE 666 IF. RHEOLATE IF series is an isothiazoline-free rheology additive product developed by Elementis. The release of three new products will help Elementis further expand the application scope of its rheology additives and meet the performance needs of the coatings industry in different applications.

According to EU ECHA regulations, additives must be free of MIT, and the RHEOLATE IF series was developed mainly to replace rheological thickeners containing biocides BIT/MIT. This series of products has low VOC content and contains no solvents. The RHEOLATE IF Series offers unique rheological properties to optimize product performance and label compliance requirements. Elementis has expanded its RHEOLATE IF range to help coating manufacturers comply with labeling requirements and be prepared to meet end-user health and safety requirements.

Elementis is a global specialty chemicals company that improves performance through continuous innovation and partners with customers around the world to provide innovative and leading technologies in the personal care, coatings, energy and talc fields. Elementis provides a variety of rheological additives and specialty additives in architectural and industrial coatings, adhesives, sealants and inks. By working closely with customers, Elementis develops innovative solutions for water-based, solvent-based and solvent-free systems that enhance the look, feel and stability of their products. Leverage their advanced technologies to meet customer performance needs with rheology additives, wetting and dispersing additives, defoamers, waxes and smoothing agents, adhesion promoters and other functional additives.

Elementis' current brands in China include BENTONE®, BENGEL®, RHEOLATE®, THIXATROL®, THIXCIN®, M-P-A®, DeuRheo, NALZIN®, Defom, Levelol, Levaslip, Adherant, DAPRO®, Disponer, NUOSPERSE® and Hypomer, etc.